| 摘要 |
<p>PROBLEM TO BE SOLVED: To prevent clogging of a coolant gas passage and damage to a substrate due to a frozen film in a substrate processing device and a substrate processing method which process the substrate by forming a liquid film on the substrate, freezing the formed film, and thawing the frozen film.SOLUTION: A substrate processing device comprises: liquid film forming means 41 for forming a liquid film by supplying a liquid to an upper surface of a substrate W held in a nearly horizontal attitude; a coolant gas discharge nozzle 51 which discharges a coolant gas whose temperature is lower than a freezing point of the liquid constituting the liquid film to the liquid film; a thawing liquid discharge nozzle 52 which discharges a thawing liquid to a frozen film formed by freezing the liquid film; thawing liquid supply means for supplying the heated thawing liquid to the thawing liquid discharge nozzle via a piping; and receiving means 59 for receiving the coolant gas discharged from the coolant gas discharge nozzle positioned at its retreat position and the thawing liquid discharged from the thawing liquid discharge nozzle positioned at its retreat position and circulating them in a common passage.</p> |
