| 摘要 |
<p>A wafer monitoring apparatus of the present embodiment, to perform a process of monitoring the surface of a wafer, includes: a wafer monitoring box having an interior space; a measuring part which is arranged in the wafer monitoring box and receives the wafer; a supply part which supplies air into the wafer monitoring box ; an air supply hose which guides air supplied from the air supply part to the measuring part; an air discharge hose which becomes the discharge path of air supplied from the measuring part; a pressure measuring part which measures pressure in the air supply part; and a monitoring part which determines whether or not a pressure value measured by the pressure measuring part is lower than a predetermined reference value.</p> |
