发明名称 THIN FILM TRANSISTOR AND METHOD OF MANUFACTURING THE SAME
摘要 <p>A thin film transistor include a substrate, a gate electrode formed on the substrate, a buffer layer which partly covers both sides of the gate electrode, a gate insulating layer which covers the gate electrode and the buffer layer, an active layer formed on the gate insulating layer, an etch barrier layer which is formed on the active layer and has a first opening and a second opening, a source electrode which is formed on the etch barrier layer and touches the active layer through the first opening, and a drain electrode which is formed on the etch barrier layer and touches the active layer through the second opening.</p>
申请公布号 KR20150011472(A) 申请公布日期 2015.02.02
申请号 KR20130086426 申请日期 2013.07.23
申请人 发明人
分类号 H01L21/336;H01L29/786 主分类号 H01L21/336
代理机构 代理人
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