发明名称 |
SILICONE SKELETON-CONTAINING POLYMERIC COMPOUND, CHEMICALLY AMPLIFIED NEGATIVE RESIST MATERIAL, PHOTOCURABLE DRY FILM, PATTERN FORMING METHOD, AND ELECTRIC-ELECTRONIC COMPONENT PROTECTIVE COATING |
摘要 |
PROBLEM TO BE SOLVED: To significantly improve a problem of peeling that occurs particularly on a substrate such as SiN.SOLUTION: A silicone skeleton-containing polymeric compound is provided which has a recurring unit of formula (1) below and a weight average molecular weight of 3,000 to 500,000. In the formula, Rto Rrepresent a monovalent hydrocarbon group; l represents 0 to 100; m represents 1 to 100; a and b represent a positive number and c and d represent 0 or a positive number, satisfying a+b+c+d=1; Rrepresents a phenyl substituent containing a hydroxyl or alkoxy group, expressed by formula (4); Rrepresents a monovalent hydrocarbon group which may be the same as or different from Rto R, or a phenyl substituent containing a hydroxyl or alkoxy group, which may be the same as or different from R; and X and Y represent an organic group including a plurality of aromatic rings having a hydroxyl or glycidyl group. |
申请公布号 |
JP2015021106(A) |
申请公布日期 |
2015.02.02 |
申请号 |
JP20130152354 |
申请日期 |
2013.07.23 |
申请人 |
SHIN ETSU CHEM CO LTD |
发明人 |
ASAI SATOSHI;URANO HIROYUKI;TAKEMURA KATSUYA |
分类号 |
C08G77/52;G03F7/004;G03F7/038;G03F7/075;G03F7/09;G03F7/40;H01L21/027;H05K3/28 |
主分类号 |
C08G77/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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