发明名称 ACTIVATION CONTAINER AND KIT USED FOR REDUCTION PROCESSING DEVICE FOR ELECTRON AFFINITY, REDUCTION PROCESSING DEVICE FOR ELECTRON AFFINITY WITH THE KIT, PHOTOCATHODE ELECTRON BEAM SOURCE, ELECTRON GUN WITH PHOTO CATHODE ELECTRON BEAM SOURCE, FREE ELECTRON LASER ACCELERATOR, TRANSMISSION ELECTRON MICROSCOPE, SCANNING ELECTRON MICROSCOPE, ELECTRON BEAM HOLOGRAPHY MICROSCOPE, ELECTRON BEAM LITHOGRAPHY DEVICE, ELECTRON BEAM DIFFRACTION DEVICE AND ELECTRON BEAM INSPECTION DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a reduction processing device for electron affinity capable of performing EA surface processing by atomizing a surface processing material and depositing it to a photo cathode material within a single vacuum chamber and further capable of performing EA surface processing again on a photo cathode after the lapse of a fixed time, an activation container and kit available for the reduction processing device for electron affinity, a photo cathode electron beam source, an electron gun with the photo cathode electron beam source, a free electron laser accelerator, a transmission electron microscope, a scanning electron microscope, an electron beam holography microscope, an electron beam lithography device, electron beam diffraction device and an electron beam inspection device.SOLUTION: An activation container 20 used for a reduction processing device for electron affinity includes a hole 21 through which electrons can be passed.
申请公布号 JP2015022810(A) 申请公布日期 2015.02.02
申请号 JP20130147682 申请日期 2013.07.16
申请人 NAGOYA UNIV 发明人 NISHITANI TOMOHIRO
分类号 H01J37/073;H01J1/34 主分类号 H01J37/073
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