发明名称 STRUCTURE SEMICONDUCTRICE DU TYPE PHOTODIODE A AVALANCHE A HAUT RAPPORT SIGNAL SUR BRUIT ET PROCEDE DE FABRICATION D'UNE TELLE PHOTODIODE
摘要 <p>The invention relates to an avalanche photodiode semiconductor structure (1) for receiving electromagnetic radiation in a given wavelength range and comprising a first semiconductor area (210) suitable for absorbing the electromagnetic radiation, a second area (310) suitable for providing a multiplication of carriers, and a third semiconductor area (410) in contact with the second semiconductor area (310). The second area (310) comprises at least two subparts (321, 322), the second subpart (322) being suitable for presenting a mean carrier multiplication rate that is greater than that of the first subpart (321). The invention also relates to a method for manufacturing such a structure (1).</p>
申请公布号 FR3000609(B1) 申请公布日期 2015.01.30
申请号 FR20120062991 申请日期 2012.12.31
申请人 COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIESALTERNATIVES 发明人 ROTHMAN JOHAN
分类号 H01L31/107;H01L31/0248 主分类号 H01L31/107
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