| 摘要 |
<p>The purpose of the present invention is to provide a photosensitive resin composition for forming a spacer which has excellent properties such as transmittance, chemical resistance, thermal resistance, etc, and has no increase of viscosity by significantly improving adhesion and high thermal resistance. The present invention relates to a photosensitive resin composition for forming a spacer comprising: silicon acrylate represented by chemical formula 1, an alkali soluble resin, a photopolymerization compound, a photopolymerization innitiator, and a solvent, and to the spacer manufactured by the composition.</p> |
