| 摘要 |
<p>The present invention relates to an apparatus for removing a particle attached to a glove of a worker during a semiconductor manufacturing process. An apparatus for removing a particle according to the present invention includes: an adhesion roller having a surface on which an adhesion part to which foreign materials are attached such as a particle is formed, and a central portion through which a roller shaft passes; and a casing provided with an adhesion roller receiving space into which the adhesion roller may be inserted, connected to both ends of the roller shaft, and provided with an opening part in which the adhesion part of the adhesion roller and a particle removing target object make contact with each other, wherein the adhesion roller may make contact with the particle removing target object while being rotated about the roller shaft. Therefore, the apparatus for removing a particle can easily remove the particle attached to a glove by using the rotating adhesion roller.</p> |
