发明名称 |
METHOD FOR MEASURING DISTORTION OF PROJECTION OBJECTIVE |
摘要 |
A method for measuring distortion of a projection objective, which includes: obtaining a plurality of first positional deviations between two groups of patterns formed respectively after two exposures performed in a same exposure field during a stepping and exposing process of the reticle stage (S21); obtaining a plurality of second positional deviations between two groups of patterns formed respectively after another two exposures performed in a same exposure field during a stepping and exposing process of the workpiece stage (S22); subtracting motional errors of the reticle stage and/or workpiece stage from each of the plurality of first and second positional deviations to obtain corresponding first and second corrected deviations (S43, S44); calculating differences each between a pair of corrected deviations (S45); and calculating the distortion of the projection objective by a fitting process (S46). |
申请公布号 |
EP2690496(A4) |
申请公布日期 |
2015.01.28 |
申请号 |
EP20120761311 |
申请日期 |
2012.03.21 |
申请人 |
SHANGHAI MICRO ELECTRONICS EQUIPMENT CO., LTD. |
发明人 |
FANG, LI;SUN, GANG;MIN, JINHUA;ZHANG, JUN |
分类号 |
G03F7/20;G03F1/44;H01L21/66 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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