| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method and device for observing a specimen allowing a minute pattern to be observed. <P>SOLUTION: According to this method for observing a specimen, the pattern of the specimen is observed by using an electron beam. In this method, the electron beam is applied to the specimen to detect mirror electrons arising therefrom by the application of the electron beam, and an image of the specimen is generated from the detected mirror electrons. In a step of applying the electron beam, an electron beam is applied to the specimen with the landing energy LE of the electron beam adjusted so that applied electrons U-turn in a recess pattern to act as mirror electrons when the electron beam is applied thereto in a recess pattern with edges on both sides. A suitable condition therefor is LEA≤LE≤LEB+5[eV]. <P>COPYRIGHT: (C)2011,JPO&INPIT |
