发明名称 PHOTOSENSITIVE RESIN COMPOSITION FOR TRANSPARENT PIXEL
摘要 <p>The present invention relates to a photosensitive resin composition for forming a transparent pixel. In the present invention, provided is a photosensitive resin composition for forming transparent pixels comprising (A) an alkali-soluble resin; (B) a compound whose absorbance is not more than 350 nm as an UV stabilizer; (C) a photopolymerizable compound; (D) a photopolymerizable initiator; and (E) a solvent. According to the present invention, the photosensitive composition for forming transparent pixels is allowed to easily fine pixels and perform contact holes to form transparent electrodes.</p>
申请公布号 KR20150010444(A) 申请公布日期 2015.01.28
申请号 KR20130085484 申请日期 2013.07.19
申请人 DONGWOO FINE-CHEM CO., LTD. 发明人 KIM, SUNG MIN;KIM, JU HO;PARK, SEUL KI
分类号 G03F7/004;G02B5/20 主分类号 G03F7/004
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