<p>Disclosed are a channel layer and a transistor including the channel layer. The channel layer may include a multi-layered structure. Layers forming the channel layer may have different mobilities and/or carrier densities. The channel layer may have a double layered structure including a lower layer and an upper layer which may be formed of different oxides. Characteristics of the transistor may vary according to materials used to form the lower layer and the upper layer and thickness thereof.</p>
申请公布号
EP2146379(B1)
申请公布日期
2015.01.28
申请号
EP20090165080
申请日期
2009.07.09
申请人
SAMSUNG ELECTRONICS CO., LTD.
发明人
KIM, SUN-IL;KIM, SANG-WOOK;PARK, JAE-CHUL;KIM, CHANG-JUNG;SONG, I-HUN