| 摘要 |
<p>The present invention relates to a sputtering apparatus (10) to form a thin film in a long film. According to the present invention, the sputtering apparatus (10) comprises: a vacuum chamber (11); a vacuum pump (12) to discharge air from the vacuum chamber (11); a supply roll (13) to supply a long film (17); a storage roll (16) to store the long film (17); a film forming roll (15) formed inside the vacuum chamber (11) to transport the long film (17) along the surface thereof; a target (18) to face the film forming roll (15); a gas pipe (21) to supply gas inside the vacuum chamber (11); a guide roll (28) to guide the long film (17); a guide roll shaft (24) equipped in both ends of the guide roll (28); a bearing (25) to support the guide roll shaft (24); and an insulator (26) to insulate a gap between the guide roll shaft (24) and the bearing (25). Moreover, a contact surface with the long film (17) of the guide roll (28) is floating potential.</p> |
