| 摘要 |
<p>PURPOSE:To discriminate the acceptable or defective feed-pitch of a mask pattern by using a synthetic vernier pattern constituted by a vernier pattern at an arbitrary position and adjacent vernier pattern as a reference and comparing the shape of the synthetic vernier pattern with the shapes of other synthetic vernier patterns. CONSTITUTION:The image of a synthetic vernier pattern at an arbitrary position is picked up by an image sensor. The image is subdivided, the subdivided image is converted into an electric signal and signals are arranged in order of scanning in the image sensor, the image of the synthetic vernier pattern is extracted as an electric signal and memorized to a memory storage, and the signal is employed as a reference synthetic vernier pattern signal. On the other hand, the images of other synthetic vernier patterns are also processed similarly by the image sensor. A point of difference between the synthetic vernier patterns can be detected by comparing and collating the electric signals of two kinds, and the point of difference can be displayed.</p> |
