发明名称 |
IMPROVED DENSIFICATION FOR FLOWABLE FILMS |
摘要 |
<p>A method of forming a dielectric layer is described. The method first deposits an initially-flowable layer on a substrate. The initially-flowable layer is then densified by exposing the substrate to a high-density plasma (HDP). Essentially no additional material is deposited on the initially-flowable layer, in embodiments, but the impact of the accelerated ionic species serves to condense the layer and increase the etch tolerance of the processed layer.</p> |
申请公布号 |
KR20150009959(A) |
申请公布日期 |
2015.01.27 |
申请号 |
KR20147028790 |
申请日期 |
2013.04.09 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
LIANG JINGMEI;HONG, SUK WON;CHOI, JUN TAE |
分类号 |
H01L21/31;H01L21/205;H01L21/8242;H01L27/108 |
主分类号 |
H01L21/31 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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