发明名称 APPARATUS FOR HEAT TREATING A SUBSTRATE
摘要 <p>PURPOSE: A substrate heat processing device is provided to simplify the assembling and attaching process of a suction pipe to a heat processing plate by using a connection member which has a heat-resistant property. CONSTITUTION: A cassette station(2) draws in and out a wafer from a cassette(C). A wafer carrier arm(7), which moves along a carrier path(6), is installed in the cassette station. A processing station(3) is formed by arranging several processing units in a multiple stage. The processing station comprises five processing unit groups. A first return device(110) is installed between a third processing unit group(G3) and a fourth processing unit group(G4). A second return device(120) is installed between the fourth processing unit group and a fifth processing unit group(G5).</p>
申请公布号 KR101486598(B1) 申请公布日期 2015.01.26
申请号 KR20090125380 申请日期 2009.12.16
申请人 发明人
分类号 H01L21/324 主分类号 H01L21/324
代理机构 代理人
主权项
地址
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