发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED FILM, CURED FILM, ORGANIC EL DISPLAY DEVICE, AND LIQUID CRYSTAL DISPLAY DEVICE |
摘要 |
<p>Provided is a photosensitive resin composition capable of achieving adhesion with a substrate when used as a cured film and during development. This photosensitive resin composition contains: (A) a polymer component containing a polymer that satisfies (1) and/or (2), (1) being a polymer having a constituent unit (a1) that has a group in which an acid group is protected by an acid-decomposable group, and a constituent unit (a2) having a crosslinking group, and (2) being a polymer having a constituent unit (a1) that has a group in which an acid group is protected by an acid-decomposable group, and a polymer having a constituent unit (a2) having a crosslinking group; (B) a nonionic photoacid generator; (C) a compound represented by the general formula (S) below (in the formula, R1 represents a group containing at least one or more nitrogen atoms, A represents a bivalent linking group, and R2 represents an organic group.); (D) a solvent; and (E) an alkoxysilane compound.</p> |
申请公布号 |
KR20150009591(A) |
申请公布日期 |
2015.01.26 |
申请号 |
KR20147034984 |
申请日期 |
2013.06.18 |
申请人 |
FUJIFILM CORPORATION |
发明人 |
YAMAZAKI KENTA;HIKITA MASANORI;SHIMOYAMA TATSUYA;KAWASHIMA TAKASHI;YAMADA SATORU;YONEZAWA HIROYUKI |
分类号 |
G03F7/039;C08F220/26;G03F7/004;G03F7/075;G03F7/40;H01L21/027;H01L51/50 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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