发明名称 ACID DIFFUSION CONTROL AGENT, RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, COMPOUND, AND METHOD FOR PRODUCING COMPOUND
摘要 An acid diffusion control agent includes a compound represented by a formula (1), a compound represented by a formula (2) or both thereof. R1 represents a hydrocarbon group comprising a monovalent alicyclic structure, or the like. R2 and R3 each independently represent a monovalent hydrocarbon group, or the like. R4 and R5 each independently represent a monovalent hydrocarbon group, or the like. R6 and R7 each independently represent a monovalent hydrocarbon group, or the like. R8 represents a monocyclic heterocyclic group together with the ester group and with the carbon atom. n is an integer of 1 to 6. R9 represents a monovalent hydrocarbon group, or the like. R10 represents a monovalent hydrocarbon group having 1 to 10 carbon atoms. R11 and R12 each independently represent a monovalent hydrocarbon group, or the like. R13 and R14 each independently represent a monovalent hydrocarbon group, or the like.
申请公布号 KR20150009547(A) 申请公布日期 2015.01.26
申请号 KR20147032129 申请日期 2013.05.08
申请人 JSR CORPORATION 发明人 NAMAI HAYATO;IKEDA NORIHIKO
分类号 G03F7/004;C07C227/08;C07C229/12;C07D211/14;C07D215/06;G03F7/039 主分类号 G03F7/004
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