INDUCTIVELY COUPLED PLASMA PROCESSING APPARATUS

摘要

Provided by the present invention is an inductively coupled plasma processing apparatus which generates uniform plasma in a processing chamber even though a divided type metal window is included. For the aforementioned, the inductively coupled plasma processing apparatus includes: a main body container (1); a processing chamber (4) which accommodates a processed body (G) and performs an inductively coupled plasma processing in the accommodated processed body (G); and a metal window (2) of a rectangular shape which has conductivity which is arranged in an antenna room (3) which accommodates a high frequency antenna (11) for generating inductively coupled plasma in the processing chamber (4). The high frequency antenna (11) is arranged to be wound in a surface which corresponds to the rectangular metal window (2) in the antenna room (3). The rectangular metal window (2) is divided into multiple divided pieces (2a to 2d) which are electrically insulated from each other. The divided pieces (2a to 2d) are hung from a top board (3b) of the antenna room (3) by a hanging member (8) without being respectively put on different members.