发明名称 COMPOSITION FOR FORMING PATTERNS OF NON-DISPLAY PART
摘要 The present invention relates to a composition for forming a pattern of a non-displaying part. More specifically, the composition includes a silane compound having an isocyanate group and thus has significantly increased chemical resistance. Therefore, the composition can be used for forming the pattern, which has excellent adhesiveness even after a post process of exposing the pattern to a plurality of chemicals. The silane compound having an isocyanate group is at least one selected from 3-(triethoxysilyl) propyl isocyanate, (trimethylsilyl) isocyanate, tetraisocyanate silane, methyl triisocyanate silane, mono-methoxy-triisocyanate silane, and γ-isocyanate propyl trimethoxysilane.
申请公布号 KR20150008518(A) 申请公布日期 2015.01.23
申请号 KR20130081706 申请日期 2013.07.11
申请人 DONGWOO FINE-CHEM CO., LTD. 发明人 CHUN, JI MIN;CHANG, WON YOUNG;CHOI, YONG SEOK
分类号 C09D11/00;C09D11/10;G02F1/13 主分类号 C09D11/00
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