发明名称 CLEANING LIQUID, CLEANING APPARATUS AND CLEANING METHOD FOR RESIST REMOVER LIQUID FILTRATION FILTER
摘要 According to the present invention, a filter used for filtration of a resist remover liquid, which has removed a positive resist from a substrate, is recycled for reuse as a filtration filter by removing the resist therefrom. By immersing a used resist remover liquid filtration filter in a cleaning liquid for resist remover liquid filtration filters, said cleaning liquid containing 2.5-12.5% by mass of ammonia relative to the total mass of the cleaning liquid and 8.8-17.5% by mass of hydrogen peroxide relative to the total mass of the cleaning liquid, a resist adhering to the filtration filter is able to be removed, thereby enabling reuse of the resist remover liquid filtration filter.
申请公布号 WO2015008443(A1) 申请公布日期 2015.01.22
申请号 WO2014JP03524 申请日期 2014.07.02
申请人 PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD. 发明人 FUCHIGAMI, SHINICHIROU
分类号 B01D41/04;B01D19/02;B08B3/08;H01L21/027;H01L21/304 主分类号 B01D41/04
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