发明名称 METHOD FOR FORMING COATING FILM, PROGRAM, AND COMPUTER STORAGE MEDIUM
摘要 PROBLEM TO BE SOLVED: To provide a method for forming a coating film by coating a substrate having height differences with a coating liquid by which a coating film with less height differences can be formed while suppressing the influence of height differences on a substrate.SOLUTION: A method for forming a coating film comprises the steps of: heating a substrate coated with a coating liquid at a first temperature equal to or higher than a volatilization temperature of solvent of the coating liquid, and lower than a glass transition point; then, heating the substrate at a second temperature equal to or higher than a glass transition point of the coating liquid, and lower than a start temperature of crosslink of the coating liquid; and then, heating the substrate at a third temperature equal to or higher than the start temperature of crosslink of the coating liquid, and lower than a decomposition temperature of material of the coating film to form the coating film. The heat treatments on the substrate are performed by irradiating the substrate with light.
申请公布号 JP2015015370(A) 申请公布日期 2015.01.22
申请号 JP20130141295 申请日期 2013.07.05
申请人 TOKYO ELECTRON LTD 发明人 UEDA KENICHI
分类号 H01L21/027;B05C9/14;G03F7/16;H01L21/3065;H05B3/10 主分类号 H01L21/027
代理机构 代理人
主权项
地址