| 发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING PATTERNED CURED FILM, AND ELECTRONIC COMPONENT |
| 摘要 |
The invention provides a photosensitive resin composition comprising (A) an alkali-soluble resin having a phenolic hydroxyl group, (B) a compound that generates an acid by light, and (C) an acrylic resin having a group that crosslinks with the component (A), as well as a method for manufacturing a patterned cured film, and an electronic component prepared therewith. |
| 申请公布号 |
US2015024173(A1) |
申请公布日期 |
2015.01.22 |
| 申请号 |
US201314377323 |
申请日期 |
2013.02.04 |
| 申请人 |
Hitachi Chemical Co., Ltd. |
发明人 |
Tahara Shingo;Katogi Shigeki;Matsutani Hiroshi;Abe Kouichi;Tanimoto Akitoshi;Aoki Yu |
| 分类号 |
G03F7/038;G03F7/40 |
主分类号 |
G03F7/038 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A photosensitive resin composition comprising:
(A) an alkali-soluble resin having a phenolic hydroxyl group; (B) a compound that generates an acid by light; and (C) an acrylic resin having a group that crosslinks with the component (A). |
| 地址 |
Tokyo JP |
