| 摘要 |
<p>An imprint apparatus is disclosed that forms, by pressing a resin applied onto a substrate and a mold against each other, a pattern on the substrate. The imprint apparatus includes a substrate stage that holds the substrate, and a control unit for controlling the position of the stage by outputting a manipulating variable on the basis of a position error between a position of the stage which has been measured by position measurement unit and a target position. The control unit reduces a ratio of the manipulating variable to the position error while the substrate and the mold are in contact with each other until mold release.</p> |
