CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a chemically amplified positive resist composition which can give uniform distribution of a base, can control diffusion of the base, can improve line edge roughness as well as suppress temperature dependency, and promises high resolution in the process of forming a resist pattern where an ultrafine pattern is demanded.SOLUTION: The chemically amplified positive resist composition comprises: a polymeric compound (PB) having a recurring unit having a phenolic hydroxyl group and a recurring unit of a nitrogen-containing structure; and a polymeric compound (PA) having a photo-acid generating recurring unit and a recurring unit having an acidic side chain protected with an acid labile protective group.