LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a device that effectively removes liquid from a vicinity of a substrate, and does not cause vibration and other disturbance.SOLUTION: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth an uneven flow. A pressure difference of the both ends of the porous member may be maintained at a bubble point or lower of the porous member, thereby a single-phase liquid flow can be obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.