| 摘要 |
PROBLEM TO BE SOLVED: To provide a film deposition device and a film deposition method, with which it is possible to suppress a temperature difference in a vertical direction of a substrate under film deposition processing.SOLUTION: A film deposition device includes: a chamber that accommodates a boat having a substrate plate on which a substrate that is a processing target is mounted in a longitudinal direction; a bottom face heater that heats a bottom face of the boat in the chamber; a control device that controls a set temperature of the bottom face heater so that a temperature difference between a lower part and an upper part of the substrate plate becomes equal to or smaller than a constant value; a side face heater that heats a side face of the boat in the chamber; and a gas supply device that supplies process gas into the chamber, wherein a thin film, whose main component is a raw material contained in the process gas, is formed on the substrate. |
