| 发明名称 |
PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION APPARATUS AND METHOD OF MANUFACTURING DISPLAY APPARATUS USING THE SAME |
| 摘要 |
A plasma-enhanced chemical vapor deposition (“PECVD”) apparatus includes: an ejecting unit which is configured to eject a gas toward a substrate onto which the gas is deposited; a lift which is configured to support and selectively raise or lower a mask unit in which is defined a pattern through which the gas ejected from the ejecting unit passes towards the substrate; and a susceptor into which a portion of the lift is inserted, and which is configured to linearly move the substrate. A temperature of the lift is variable. |
| 申请公布号 |
US2015024147(A1) |
申请公布日期 |
2015.01.22 |
| 申请号 |
US201314066842 |
申请日期 |
2013.10.30 |
| 申请人 |
Samsung Display Co., Ltd. |
发明人 |
Lee Jung-Sik;Heo Myung-Su;Jung Seok-Won |
| 分类号 |
C23C16/458 |
主分类号 |
C23C16/458 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A plasma-enhanced chemical vapor deposition apparatus comprising:
an ejecting unit which is configured to eject a gas toward a substrate onto which the gas is deposited; a lift which is configured to support and selectively raise or lower a mask unit in which is defined a pattern through which the gas ejected from the ejecting unit passes towards the substrate, wherein a temperature of the lift is variable; and a susceptor into which a portion of the lift is inserted, and which is configured to linearly move the substrate. |
| 地址 |
Yongin-City KR |
