发明名称 FIELD-EFFECT TRANSISTOR
摘要 In a field-effect transistor, the carbon concentration on the high-resistance-layer (3) side of a buffer layer (2) is 0.8 × 1019/cm3 to 1.0 × 1021/cm3, the carbon concentration on the buffer-layer (2) side of the high-resistance layer (3) is 3.7 × 1018}/cm3 to 1.0 × 1021/cm3, and the carbon concentration on the channel-layer (4) side of the high-resistance layer (3) is 1.4 × 1019}/cm3 to 1.0 × 1021/cm3.
申请公布号 WO2015008532(A1) 申请公布日期 2015.01.22
申请号 WO2014JP63101 申请日期 2014.05.16
申请人 SHARP KABUSHIKI KAISHA 发明人 NAGAHISA, TETSUZO;HANDA, SHINICHI
分类号 H01L21/338;H01L21/336;H01L29/778;H01L29/78;H01L29/812 主分类号 H01L21/338
代理机构 代理人
主权项
地址
您可能感兴趣的专利