| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a method for suppressing productivity reduction due to opening of a vacuum tank of a film deposition apparatus to the atmosphere, by reducing the frequency of replacing a deposition-preventing member.SOLUTION: A film deposition apparatus 1000 is provided with deposition preventing plates 120 as deposition preventing members disposed turnably in a chamber 111 as a vacuum tank and each having a cross-section formed in a triangle shape. Even if a film is deposited on one face of the deposition preventing member having the cross-section of a polygonal shape, the deposition preventing member is turned to arrange two faces of the non-film-deposited state different from that one face, to face the inner side of the vacuum tank. Thus, the films can be deposited to the three faces of sides of the deposition preventing member, respectively, thereby reducing a frequency of replacing the deposition preventing member to about one third.</p> |
