发明名称 |
MANUFACTURING METHOD OF GRAPHENE TRANSPARENT CONDUCTIVE FILM AND GRAPHENE TRANSPARENT CONDUCTIVE FILM MANUFACTURED THEREWITH |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide a technique solving problems of graphene film formation with traditional thermal CVD or resin carbonization, without using carbon content gas such as methane, forming graphene at low temperature in a short time, and controlling a number of layers.SOLUTION: By making a very small amount of carbon contained in a metal substrate precipitate on the surface of the substrate by heating, and by plasma treatment using hydrogen gas under decompression, graphene grows on the substrate surface, and a graphene transparent conductive film is provided.</p> |
申请公布号 |
JP2015013797(A) |
申请公布日期 |
2015.01.22 |
申请号 |
JP20140117973 |
申请日期 |
2014.06.06 |
申请人 |
NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL & TECHNOLOGY |
发明人 |
HASEGAWA MASATAKA;KATO RYUICHI;TSUGAWA KAZUO;ISHIHARA MASANORI;OKIKAWA YUKI;YAMADA TAKATOSHI |
分类号 |
C01B31/02;C22C9/00;C23C26/00;H01B5/14;H01B13/00 |
主分类号 |
C01B31/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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