发明名称 MANUFACTURING METHOD OF GRAPHENE TRANSPARENT CONDUCTIVE FILM AND GRAPHENE TRANSPARENT CONDUCTIVE FILM MANUFACTURED THEREWITH
摘要 <p>PROBLEM TO BE SOLVED: To provide a technique solving problems of graphene film formation with traditional thermal CVD or resin carbonization, without using carbon content gas such as methane, forming graphene at low temperature in a short time, and controlling a number of layers.SOLUTION: By making a very small amount of carbon contained in a metal substrate precipitate on the surface of the substrate by heating, and by plasma treatment using hydrogen gas under decompression, graphene grows on the substrate surface, and a graphene transparent conductive film is provided.</p>
申请公布号 JP2015013797(A) 申请公布日期 2015.01.22
申请号 JP20140117973 申请日期 2014.06.06
申请人 NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL & TECHNOLOGY 发明人 HASEGAWA MASATAKA;KATO RYUICHI;TSUGAWA KAZUO;ISHIHARA MASANORI;OKIKAWA YUKI;YAMADA TAKATOSHI
分类号 C01B31/02;C22C9/00;C23C26/00;H01B5/14;H01B13/00 主分类号 C01B31/02
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