EXPOSURE APPARATUS AND TRANSFER CHARACTERISTICS MEASURING METHOD

摘要

According to one embodiment, an exposure apparatus includes a light blocking unit that blocks an exposure light reflected on a reflective mask at a part other than an aperture; a detection unit that measures a light intensity of the exposure light passed through the light blocking unit; and a calculation unit that calculates, based on the light intensity, a transfer characteristic when a pattern on the reflective mask is transferred to a substrate. In the light blocking unit, a position on an aperture plane and a position in an optical axis direction of the exposure light are adjusted. The calculation unit calculates the transfer characteristic based on the position in the optical axis direction in which the light intensity is maximized.

主权项

1. An exposure apparatus comprising:
a light blocking unit that passes an exposure light reflected on a reflective mask through an aperture and blocks the exposure light at a part other than the aperture; a detection unit that measures a light intensity of the exposure light passed through the light blocking unit; and a calculation unit that calculates, based on the light intensity, a transfer characteristic when a pattern on the reflective mask is transferred to a substrate, wherein, in the light blocking unit, an in-plane position that is a position of the aperture on an aperture plane is adjusted and a position in an axial direction that is a position in an optical axis direction of the exposure light is adjusted, and the calculation unit calculates the transfer characteristic based on the position in the axial direction in which the light intensity is maximized.