发明名称 |
POLYCRYSTALLINE DIAMOND MATERIALS HAVING IMPROVED ABRASION RESISTANCE, THERMAL STABILITY AND IMPACT RESISTANCE |
摘要 |
PCD materials comprise a diamond body having bonded diamond crystals and interstitial regions disposed among the crystals. The diamond body is formed from diamond grains and a catalyst material at high pressure/high temperature conditions. The diamond grains have an average particle size of about 0.03 mm or greater. At least a portion of the diamond body has a high diamond volume content of greater than about 93 percent by volume. The entire diamond body can comprise high volume content diamond or a region of the diamond body can comprise the high volume content diamond. The diamond body includes a working surface, a first region substantially free of the catalyst material, and a second region that includes the catalyst material. At least a portion of the first region extends from the working surface to depth of from about 0.01 to about 0.1 mm. |
申请公布号 |
US2015021101(A1) |
申请公布日期 |
2015.01.22 |
申请号 |
US201414507590 |
申请日期 |
2014.10.06 |
申请人 |
Smith International, Inc. |
发明人 |
Keshavan Madapusi K.;Zhang Youhe;Shen Yuelin;Griffo Anthony;Janssen Michael |
分类号 |
E21B10/55;B24D18/00;B24D3/10 |
主分类号 |
E21B10/55 |
代理机构 |
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代理人 |
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主权项 |
1. A cutting element comprising:
a polycrystalline diamond body comprising a plurality of bonded diamond crystals and a plurality of interstitial regions disposed among the crystals, the body comprising a first region substantially free of a catalyst material used to sinter the diamond body and a second region that includes the catalyst material, wherein at least a portion of the first region extends from a working surface of the body to a depth of less than about 0.08 mm, and wherein the diamond body includes a diamond content greater than about 93 percent by volume at first location and a diamond content less than about 93 percent at a second location; and a substrate joined to the diamond body selected from the group consisting of metallic materials, ceramic materials, cermet materials and mixtures thereof. |
地址 |
Houston TX US |