| 摘要 |
In the present invention, the following are provided: a laser light source that can change the wavelength of emitted laser light or change spectral line width; a mask on which is formed a pattern for generating diffraction light by using the projection of the laser light; and a control unit that controls the wavelength of the laser light which was emitted by the laser light source, or the spectral line width, in accordance with the distance between the mask and the substrate. The laser light emitted by the laser light source is projected onto the mask, and on the surface of the substrate, proximity exposure may be carried out. |
