| 发明名称 |
POWER SUPPLY FOR A DISCHARGE PRODUCED PLASMA EUV SOURCE |
| 摘要 |
A power supply for providing HV power to a lithography illumination source comprising a HV power source arranged to provide the HV power, a HV power transmission line arranged to transmit the HV energy from the HV power source and one or more RF terminations provided on one or more of an input end of the transmission line or an output end of the transmission line. The one or more RF terminations terminate the transmission line to reduce reflection of RF energy at the end of the transmission line. |
| 申请公布号 |
US2015022795(A1) |
申请公布日期 |
2015.01.22 |
| 申请号 |
US201214131869 |
申请日期 |
2012.04.19 |
| 申请人 |
Coenen Martinus Jacobus;Siemons Guido Friedrich |
发明人 |
Coenen Martinus Jacobus;Siemons Guido Friedrich |
| 分类号 |
H05G2/00;G03F7/20 |
主分类号 |
H05G2/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A power supply for providing power to a lithography illumination source, the power supply comprising:
a voltage source configured to provide the power; a transmission line configured to transmit the power from the voltage source; and a RF termination provided on an input end of the transmission line or an output end of the transmission line, the RF termination being configured to terminate the transmission line to reduce reflection of RF energy at the end of the transmission line. |
| 地址 |
Eindhoven NL |
