High Electron Mobility Transistor and Method of Forming the Same

摘要

A semiconductor structure includes a first III-V compound layer. A second III-V compound layer is disposed on the first III-V compound layer and is different from the first III-V compound layer in composition. A carrier channel is located between the first III-V compound layer and the second III-V compound layer. A source feature and a drain feature are disposed on the second III-V compound layer. A gate electrode is disposed over the second III-V compound layer between the source feature and the drain feature. A fluorine region is embedded in the second III-V compound layer under the gate electrode. A diffusion barrier layer is disposed on top of the second III-V compound layer. A gate dielectric layer is disposed over the second III-V compound layer. The gate dielectric layer has a fluorine segment on the fluorine region and under at least a portion of the gate electrode.

主权项

1. A semiconductor structure comprising:
a first III-V compound layer; a second III-V compound layer disposed on the first III-V compound layer and different from the first III-V compound layer in composition; a third III-V compound layer disposed over the second III-V compound layer, wherein a diffusion barrier layer is interposed between the second III-V compound layer and the third III-V compound layer; and a source contact and a drain contact disposed on the second III-V compound layer, wherein the third III-V compound layer is interposed between the source contact and the drain contact.