Air Cooled Faraday Shield and Methods for Using the Same

摘要

A processing chamber and a Faraday shield system for use in a plasma processing chambers are provided. One system includes a disk structure defining a Faraday shield, and the disk structure has a process side and a back side. The disk structure extends between a center region to a periphery region. The disk structure resides within the processing volume. The system also includes a hub having an internal plenum for passing a flow of air received from an input conduit and removing the flow of air from an output conduit. The hub has an interface surface that is coupled to the back side of the disk structure at the center region. A fluid delivery control is coupled to the input conduit of the hub. The fluid delivery control is configured with a flow rate regulator. The regulated air can be amplified or compressed dry air (CDA).

主权项

1. A plasma processing apparatus, comprising:
a chamber having walls and a substrate support defined in a processing volume; a Faraday shield having a disk shape with a process side and a back side, the disk shape extending between a center region to a periphery region, the Faraday shield defined within the processing volume, such that the process side faces the substrate support; a hub having an internal plenum for passing a flow of fluid received from an input conduit and removing the flow of fluid from an output conduit, the hub having an interface surface that is thermally coupled to the back side of the Faraday shield at the center region; a fluid delivery control coupled to the input conduit of the hub, the fluid delivery control is configured with a flow rate regulator for setting a flow rate of the flow of fluid through the plenum of the hub; and a fluid removal control coupled to the output conduit for removing the flow of fluid from the plenum of the hub.