发明名称 RESISTANCE RANDOM ACCESS MEMORY
摘要 <p>The present disclosure relates to a resistance random access memory comprising a first electrode, a thin film layer formed on the first electrode and including a resistance switching layer and a switching layer bonded to each other, and a second electrode formed on the thin film layer, and relates to a method of manufacturing the same.</p>
申请公布号 KR101485024(B1) 申请公布日期 2015.01.22
申请号 KR20110000131 申请日期 2011.01.03
申请人 发明人
分类号 H01L21/8247;H01L27/115 主分类号 H01L21/8247
代理机构 代理人
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