| 摘要 |
<p>The present invention relates to a substrate cleaning apparatus. More particularly, the present invention relates to a substrate cleaning apparatus which collects a chemical solution by a kind of the chemical solution after a substrate is cleaned in a cleaning process. The substrate cleaning apparatus includes: a nozzle which injects a chemical solution onto a substrate; a spin chuck which is loaded on the substrate and rotates the substrate together; a collection unit which surrounds the spin chuck and collects the chemical solution scattered by the rotation of the substrate; and a separation unit which is formed in the lower part of the collection unit and classifies the chemical solution collected by the collection unit by a kind of the chemical solution. Thus, the substrate cleaning apparatus further includes a driving unit which rotates and elevates the collection unit. The separation unit classifies the chemical solution by a position of elevating the collection unit.</p> |
