COMPOSITION FOR FORMING FILMS, FILM PRODUCED FROM SAID COMPOSITION, AND METHOD FOR PRODUCING ORGANIC SEMICONDUCTOR ELEMENT USING SAID COMPOSITION

摘要

A composition for forming films according to the present invention comprises: a fluororesin containing a repeating unit represented by formula (1) and a repeating unit represented by general formula (2); and a fluorine-containing solvent. (R1 represents a linear hydrocarbon group having 1 to 15 carbon atoms, a branched hydrocarbon group having 3 to 15 carbon atoms, or a cyclic hydrocarbon group having 3 to 15 carbon atoms, wherein at least one of hydrogen atoms in the hydrocarbon group may be substituted by a fluorine atom or a chlorine atom, and R1 may have a hydroxy group.) The composition enables the formation of a fluororesin film on an organic semiconductor film, has resistance to an etching solution upon the formation of a subtle pattern of an organic semiconductor in photolithography or the like, and is therefore useful in an organic semiconductor element production method.