| 摘要 |
<p>Provided are an exposure device and an exposure method, which can effectively reduce a CD deviation without affecting product performance. The exposure device comprises: an exposure light source (1), a compound eye system (2) and an optical system (3), and two pieces of diaphragms (4). The two pieces of diaphragms (4) are arranged on an entrance surface side or an emergence surface side in the compound eye system (2), and the two pieces of diaphragms (4) are symmetrically arranged relative to an optical axis of the compound eye system (2), wherein the opening orientation of the two pieces of diaphragms (4) is adjusted according to the critical dimension (CD) orientation of a component to be exposed.</p> |
