发明名称 |
MICROWAVE PLASMA PROCESSING DEVICE |
摘要 |
To provide a microwave plasma-treating apparatus which is capable of generating plasma having a high degree of uniformity of density and a high density for executing large-quantity and high-speed processing, capable of generating plasma of a large area, and capable of preventing dielectric windows from being thermally broken despite the apparatus being operated with large electric power for extended periods of time. The microwave plasma-treating apparatus includes a waveguide arranged to feed microwave electric power, a plurality of microwave coupling holes formed in the waveguide in the axial direction thereof, a dielectric member of a piece of plate capable of transmitting microwaves arranged in the waveguide in the axial direction thereof under the microwave coupling holes, a gap formed between the plurality of microwave coupling holes and the dielectric member, and a cooling member for cooling the dielectric member. Desirably, the microwave coupling holes have an annular shape. |
申请公布号 |
EP2276328(A4) |
申请公布日期 |
2015.01.21 |
申请号 |
EP20090724062 |
申请日期 |
2009.03.27 |
申请人 |
NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCEAND TECHNOLOGY |
发明人 |
KIM, JAEHO;TSUGAWA, KAZUO;ISHIHARA, MASATOU;HASEGAWA, MASATAKA;KOGA, YOSHINORI |
分类号 |
H05H1/46;C23C16/511;H01J37/32 |
主分类号 |
H05H1/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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