| 摘要 |
<p>PROBLEM TO BE SOLVED: To improve the filtration effect without deteriorating the throughput.SOLUTION: A substrate processing apparatus includes: a chemical solution supply part which supplies a chemical solution onto a substrate; and a chemical solution supply system which supplies the chemical solution from a chemical solution supply source to the chemical solution supply part. The chemical solution supply system includes: a first container which is connected with the chemical solution supply source through an inlet pipeline; a second container which is connected with the chemical solution supply part through an outlet pipeline; a first pump provided at a first pipeline which connects the first container with the second container, the first pump which flows the chemical solution stored in the first container toward the second container; a first filter which is provided at the first pipeline and filters the chemical solution flowing in the first pipeline from the first container to the second container; and a second pipeline which connects the first container with the second container.</p> |
