| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method capable of easily and highly accurately manufacturing a phase type diffraction grating for an x-ray Talbot interferometer without requiring an exposure mask. <P>SOLUTION: The method for manufacturing a phase type diffraction grating 10 for an x-ray Talbot interferometer, which is configured by forming a plurality of ridge parts 10b and interposing a resin part 12 between adjacent ridge parts 10b, includes: a mold formation step for cutting groove parts on a mold base material 50 by a single-crystal diamond cutter 200 so that the width of each groove is 4μm or less; a resin formation step for applying pressure immersion of heated mold to a coating surface of a substrate obtained by applying uncured resin to a surface on which a seed layer is formed, and thereafter cooling the uncured resin to temperature at which the uncured resin is cured, separating the mold from the substrate to form the resin part having a projected part and a groove part; and a formation step of a ridge part of a diffraction grating for forming the ridge parts by electroforming a metal of thickness capable of changing, byπ/2, phase of an x-ray to be applied when the groove part obtains an image by an x-ray interferometer to the groove part of the resin part. <P>COPYRIGHT: (C)2013,JPO&INPIT</p> |
