| 摘要 |
<p>Gas piping (19-21) supplies an Ar gas to the inside of a vacuum container (1). A high frequency power supply (12) makes a high frequency current flow to planar electrodes (2, 3) from one end of each of the electrodes (2, 3). Consequently, plasma is generated in the vicinity of the surfaces of target members (4, 5) due to inductive coupling. A low frequency power supply (16) applies alternating current voltages to the electrodes (2, 3). Consequently, electrons in the plasma flow into a target member (one of the target members (4, 5)) disposed in contact with a positively biased electrode (one of the electrodes (2, 3)), and positive ions in the plasma flow into a target member (the other one of the target members (4, 5)) disposed in contact with a negatively biased electrode (the other one of the electrodes (2, 3)). Then, the electrons and the positive ions in the plasma stay between the electrodes (2, 3) and in the vicinity of the surfaces of the target members (4, 5).</p> |
