| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma light source and a plasma light generating method which can supply plasma medium stably for a desired time to a light-emitting source of EUV light, i.e. plasma, in effective wavelength region (near 13.5 nm). <P>SOLUTION: A ring-shaped insulator 16 interposed between a center electrode 12 and a guide electrode 14 and insulating them is composed of an insulating compound (e.g. LiH) which is principally composed of plasma medium (e.g. Li) and solid at room temperature. By planar discharge 2 between the center electrode 12 and the guide electrode 14, surface of the insulating compound (insulator 16) is evaporated and the plasma medium is supplied between coaxial electrodes. Subsequently, tubular discharge 4 is formed between a pair of coaxial electrodes in order to confine the plasma 3 in the axial direction. <P>COPYRIGHT: (C)2012,JPO&INPIT |
