发明名称 SEMICONDUCTOR DEVICES WITH CLOSE-PACKED VIA STRUCTURES HAVING IN-PLANE ROUTING AND METHOD OF MAKING SAME
摘要 The invention relates to a semiconductor structure, comprising a substrate of a semiconductor material having a first side (FS) and an opposite second side (BS). There is at least one conductive wafer-through via (V) comprising metal, and at least one recess (RDL) provided in the first side of the substrate and in the semiconductor material of the substrate. The recess is filled with metal and seamlessly connected with the wafer-through via. The exposed surfaces of the metal filled via and the metal filled recess are essentially flush with the substrate surface on the first side of the substrate. There is also provide an interposer comprising the above structure, further comprising contacts for attaching circuit boards and integrated circuits on opposite sides of the interposer. A method of making the structure is also provided.
申请公布号 EP2826066(A1) 申请公布日期 2015.01.21
申请号 EP20130760504 申请日期 2013.03.12
申请人 SILEX MICROSYSTEMS AB 发明人 EBEFORS, THORBJÖRN;PERTTU, DANIEL
分类号 H01L21/48;H01L21/768;H01L23/14;H01L23/48;H01L23/498;H01L23/525 主分类号 H01L21/48
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