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发明名称
记忆体之改善方法及其构造
摘要
一种记忆体构造包含一基板、一下导电层、一电阻层及一上导电层。该下导电层设置于该基板上,该电阻层设置于该下导电层上,该上导电层设置于该电阻层上。一种记忆体于电阻切换前改善方法利用一局部电场产生于该记忆体内,以改善切换特性。
申请公布号
TWI470785
申请公布日期
2015.01.21
申请号
TW101148917
申请日期
2012.12.21
申请人
国立高雄应用科技大学 高雄市三民区建工路415号
发明人
刘志益;林钊汉;黄正耀
分类号
H01L27/24
主分类号
H01L27/24
代理机构
代理人
颜豪呈 高雄市苓雅区意诚路7号9楼之1
主权项
一种记忆体之改善方法,其包含:制备一记忆体元件,且该记忆体元件包含一上导电层、一电阻层及一下导电层;于该记忆体元件之内产生一局部电场;于该记忆体元件进行初始化动作;于该记忆体元件形成数个电流传导路径;及于该记忆体元件执行记忆功能。
地址
高雄市三民区建工路415号
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