发明名称 デュアル技術トランジスタを用いた低リーク高性能スタティックランダムアクセスメモリセル
摘要 <p>A memory cell includes a storage element, a write circuit coupled to the storage element and a read circuit coupled to the storage element. At least a portion of the storage element and at least a portion of the write circuit are fabricated using a thicker functional gate oxide and at least a portion of the read circuit is fabricated using a thinner functional gate oxide.</p>
申请公布号 JP5656875(B2) 申请公布日期 2015.01.21
申请号 JP20110548100 申请日期 2010.01.21
申请人 发明人
分类号 H01L21/8244;G11C11/412;H01L27/11 主分类号 H01L21/8244
代理机构 代理人
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