An extreme ultraviolet light system includes a drive laser system that produces an amplified light beam; a target material delivery system configured to produce a target material at a target location; a beam delivery system configured to receive the amplified light beam emitted from the drive laser system and to direct the amplified light beam toward the target location; and a metrology system. The beam delivery system includes converging lens configured and arranged to focus the amplified light beam at the target location. The metrology system includes a light collection system configured to collect a portion of the amplified light beam reflected from the converging lens and a portion of a guide laser beam reflected from the converging lens. The light collection system includes a dichroic optical device configured to optically separate the portions.
申请公布号
EP2514279(A4)
申请公布日期
2015.01.21
申请号
EP20100838122
申请日期
2010.12.07
申请人
CYMER, INC.
发明人
SENEKERIMYAN, VAHAN;KIM, NAM-HYONG;BERGSTEDT, ROBERT, N.;FOMENKOV, IGOR, V.;PARTLO, WILLIAM, N.